specialty journal of engineering and applied science
Volume 4,
2019,
Issue 1
TiAlN Thin Films: Growth, Characterization and Hydrophobia the Surface of the Steel Using Low Energy Plasma Focus Device
Hasan Anousha, Eslam Ghareshabani
Pages: 75-83
Abstract
In this experimental study, a 1.5kJ Plasma Focus device of Mather type was employed to grow Titanium Aluminum Nitride (TiAlN) coatings at room temperature on 316 Stainless Steel sub-layer. The anode of the device was made of Ti and Al. A mixture of N2 and Ar gases was used as the work gas for TiAlN deposition. TiAlN Nano-particles were formed on stainless steel with 0° of the degree with respect to the anode axis by different shots at 5cm above the anode. X-ray Diffraction (XRD) results indicated the formation of the TiAlN structure on stainless steel. Scanning Electron Microscopy (SEM) images demonstrated the approximately uniform growth of TiAlN Nano-particles on the surface. EDX analysis results showed that an increase in the number of the shots increased the deposition of TiAlN on the sub-layer. According to the Atomic Force Microscopy (AFM) images, the mean thickness of the surface increased as the shots increased in number. Contact Angle analysis shows the contact angle between the droplet and the steel substrate surface 44.540 and the contact angle between the droplet and the surface of deposited TiAlN nanoparticles 100.620. Micro-hardness test results of the thin layers showed that an increase in the number of the shots increased the hardness of the samples.